Nitride Deposition Recipes
| Process | Temp. (ºC) | Pressure (mTorr) | Gas flow (sccm) | Deposition rate (nm/min) |
| Stoichiometric | 770 | 200 | NH3:DCS 24:100 | 2.68 |
| Low Stress | 800 | 200 | NH3:DCS 100:25 | 4.40 |
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