Pratt Microfabrication Facility

The Pratt Microfabrication Facility supports a wide range of silicon-based fabrication activities including photolithography, oxidation, thin film deposition, plasma etching, wet etching, device processing, packaging and analysis. The 400m2 facility is located on the 4th floor of the Pratt engineering building at the University of Toronto, and includes both a class 10,000 (ISO Class 7) microfabrication processing area and a class 1,000 (ISO Class 6) photolithography processing area.

Wallberg Nanolithography Facility

The Wallberg Nanolithography Facility (an investment of over $6 million) houses the state-of-the-art Raith EBPG5000+ Electron Beam Lithography System. The 108 m2 facility is located in the basement of the Wallberg building at the University of Toronto in order to achieve very low mechanical vibration of <10 μm/s. To ensure exceptional performance, the system is enclosed in an environmental chamber maintaining temperature stability of 21 ± 0.25 ºC, 0.1 ºC/hr. The 58 m2 Class 100 cleanroom lab space consists of the environmental chamber, control room, processing lab and gowning room, and contains a complete suite of equipment to perform nanolithography from CAD design to exposed resist development and analysis.