Bahen Prototyping Facility

From its beginnings in 2003-04, the Bahen Prototyping Facility has grown significantly in capability and now hosts the research activities of over 40 principal investigators and hundreds of students carrying out research in a wide variety of disciplines. The 230 m2 facility houses two modules, including a Class 1000 (ISO Class 6) area used for substrate cleaning, photolithographic pattern transfer and acid etching, and a Class 10,000 (ISO Class 7) area used for thermal processing, plasma etching and thin film deposition. The thousands of hours of equipment reservations each year have made the facility a crucial part of the Toronto Nanofabrication Centre.

Pratt Microfabrication Facility

The Pratt Microfabrication Facility was the first of the three TNFC facilities to be established as a modern microfabrication laboratory, and continues to support a wide range of silicon-based fabrication activities including photolithography, oxidation, thin film deposition, plasma etching, wet etching, device processing, packaging and analysis. The 400m2 facility is located on the 4th floor of the Pratt engineering building at the University of Toronto, and is designed to meet class 10,000 (ISO Class 7) cleanroom specifications while combining four dedicated class 100 (ISO Class 5) fabrication modules.

Wallberg Nanolithography Facility

The Wallberg Nanolithography Facility (an investment of over $6 million) houses the state-of-the-art Raith EBPG5000+ Electron Beam Lithography System. The 108 m2 facility is located in the basement of the Wallberg building at the University of Toronto in order to achieve very low mechanical vibration of <10 μm/s. To ensure exceptional performance, the system is enclosed in an environmental chamber maintaining temperature stability of 21 ± 0.25 ºC, 0.1 ºC/hr. The 58 m2 Class 100 cleanroom lab space consists of the environmental chamber, control room, processing lab and gowning room, and contains a complete suite of equipment to perform nanolithography from CAD design to exposed resist development and analysis.