Electron Beam Lithography

Raith EBPG 5000+ Electron Beam Lithography System

The EBPG 5000+ is a state-of-the-art Gaussian beam vector scanning electron beam lithography system. The EBPG 5000+ system is the only one of its kind in Ontario and Western Canada.

  • Exposure Resolution: < 10nm
  • Maximum Field Size: 560×560 µm2 at 100kV
  • Field Stitching Accuracy: 20nm (mean + 3σ)
  • Overlay Accuracy: 20nm (mean + 3σ)
  • Positioning Accuracy: 0.6nm (interferometric stage)

Pattern fracturing, and the associated options and capabilities, is the heart of Layout BEAMER package. The Layout BEAMER software interprets design data and converts it into the formats needed to write with the EBPG 5000+ system.

  • Input File Format: All major formats (GDSII, CIF, DXF, LTXT, bitmap)
  • Integrated Layout Editor
  • Layout Operations (healing, biasing, tone reversal, merge, Boolean operations)
  • Proximity Effect Corrections (PEC)
  • Advanced fracturing (arbitrary shapes, curved fracturing, field position control)
  • Output File Format: GPF
  • Single user (one at a time), floating (network) license

Nanolithography Wetbenches

The Wallberg Electron Beam Nanolithography Facility hosts two VPFX-6 microzone wetbench stations dedicated to substrate cleaning, EBL resist spin coating, curing, development and removal.

  • Provides a class 10 (ISO Class 4) working environment
  • Segregated, dedicated wetbench stations and resist spinners for positive tone & negative tone resist preparation
  • Vacuum enabled, dedicated hotplates with digital control
  • Includes DI water, nitrogen gas utilities and all necessary chemical supplies for EBL resist preparation

EBL Resist Recipes

ShelLab 1330GM Gravity Convection Oven

The ShelLab 1330GM Gravity Convection Oven is hosted by the Wallberg Electron Beam Nanolithography Facility and is used primarily for post-bake of electron beam lithography resists on sample substrates.

  • Recovery Time: 10 minutes at 150°C
  • Heat-up Time: 15 minutes to 150°C
  • Temperature Uniformity: ± 2.0°C at 150°C
  • Temperature Range: 40ºC to 240ºC
  • Digital electronic timer

Nikon Eclipse LV100 Microscope

Nikon’s Eclipse LV100 microscope, available in diascopic and episcopic microscope illumination modes, produces bright, clear, and high contrast images. The microscope has 4 objectives (x5, x10, x20, x50, x100), a 6 x 4” stage and a DS-Fi1 camera. Image processing is possible with the Nikon NIS-elements D3.0 imaging software.